반도체 용어사전 위키

Chemical Vapor Deposition; the most common thin film deposition method in advanced semiconductor manufacturing; deposited species are formed as a results of chemical reaction between gaseous reactants at elevated temperature in the vicinity of the substrate; solid product of the reaction is deposited on the surface of the substrate; used to deposit films of semiconductors (crystalline and non-crystalline), insulators as well as metals; variations of CVD processes include Atmospheric Pressure CVD (APCVD), Low Pressure CVD (LPCVD)and Plasma Enhanced CVD (EPCVD). (출처 : 세미파크)