반도체 용어사전 위키

1 : image mask used in conjunction with E-beam exposure tools; generally of two types: stencil, which is used with proximity E-beam and cell projection tools, and scatterer, which is used with projection E-beam tools (for example, SCALPEL).2 : a photomask produced on an E-beam mask writer to differentiate from a mask produced with other tools. (출처 : 세미파크)